Sputtering targets are mainly used in the electronics and information industries, such as integrated circuits, information storage, liquid crystal displays, laser storage, electronic control devices, etc.; it can also be used in the field of glass coating; wear-resistant materials, high temperature and corrosion resistance , High-end decorative products and other industries.
classification• According to the shape, it can be divided into square target, round target and special-shaped target，
• According to the composition, it can be divided into metal target, alloy target, ceramic compound target, quartz glass target，
• According to the application field, it is divided into microelectronics targets, magnetic recording targets, optical disc targets, precious metal targets, thin film resistance targets, conductive film targets, surface modification targets, mask layer targets, decorative layer targets, electrode target, packaging target, other targets
Metal sputtering targets
Nickel target, Ni, titanium target, Ti, zinc target, Zn, chromium target,
Cr, magnesium target, Mg, niobium target, Nb, tin target, Sn, aluminum target,
Al, indium target, In, iron target, Fe, Zirconium aluminum target, ZrAl,
titanium aluminum target, TiAl, zirconium target, Zr, aluminum silicon target,
AlSi, silicon target, Si, copper target Cu, tantalum target T, a, germanium
target, Ge, silver target, Ag, cobalt target , Co, gold target, Au, gadolinium
target, Gd, lanthanum target, La, yttrium target, Y, cerium target, Ce,
tungsten target, w, stainless steel target, nickel-chromium target, NiCr,
hafnium target, Hf, molybdenum target, Mo, Fe-Ni targets, FeNi, Tungsten
targets, W and other metal sputtering targets.
Alloy sputtering targets
High-purity alloy sputtering targets such as nickel-chromium alloy target,
nickel-vanadium alloy target, aluminum-silicon alloy target, nickel-copper
alloy target, titanium aluminum alloy, nickel-vanadium alloy target, boron-iron
alloy target, silicon-iron alloy target, etc.
Ceramic sputtering targets
ITO target, AZO target, magnesium oxide target, iron oxide target, silicon nitride target, silicon carbide target, titanium nitride target, chromium oxide target, zinc oxide target, zinc sulfide target, silicon dioxide target, silicon monoxide target, Cerium oxide target, zirconium dioxide target, niobium pentoxide target, titanium dioxide target, zirconium dioxide target, hafnium dioxide target, titanium diboride target, zirconium diboride target, tungsten trioxide target, aluminum oxide Target Tantalum pentoxide, niobium pentoxide target, magnesium fluoride target, yttrium fluoride target, zinc selenide target, aluminum nitride target, silicon nitride target, boron nitride target, titanium nitride target, silicon carbide target , Lithium niobate target, praseodymium titanate target, barium titanate target, lanthanum titanate target, nickel oxide target and other ceramic sputtering targets.
Quartz glass sputtering targets
Silicon dioxide (SiO2) sputtering target
The sputtering target supplied by our company has high dimensional accuracy, high density, uniform structure and long service life. The product has the characteristics of uniform composition, fine grain, good compactness and close combination with the inner tube, which greatly improves the utilization rate of the target and the quality of the coating layer.